rdlc data matrix

rdlc data matrix

rdlc data matrix

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fraction (XRD) (PANalytical X pert Pro) was used to identify the phases, and glancing angle X-ray diffraction (GAXRD) was performed using the same instrument to identify the phases present at the lm surfaces. The optical band gaps of the lms were determined by analyzing transmittance measurements taken in an ultraviolet (UV)/visible (VIS) spectrophotometer (Perkin-Elmer Lamda-19). Electrical measurements were performed using a four-point probe system (Bio-Rad HL5500PC) operated in the van der Pauw con guration, and a custom hot-point probe system a commercial soldering iron (Weller TC201) was used as the hot probe. Throughout the NASA GRC studies, various processing and postprocessing parameters were modi ed to determine how these affected morphology, stoichiometry, crystallography, electrical properties, and optical properties of deposited thin lms. Some of the modi cations made included varying the reactor type and con guration, deposition temperatures, location of the substrate within the reactor, annealing times, and annealing atmospheres. We will discuss several deposition designs, the details of processing experiments, and their impact on lm properties. Complete working devices were also fabricated and tested. Hence, it is the goal of this review to highlight recent advances from NASA GRC and other groups, summarizing the current stateof-the-art of this highly promising technique for thin- lm growth, exploiting molecular design of single-source precursors and monitoring lm quality as it relates to and is predictive of device performance.

1 M Nakamura, "Challenges in Semiconductor Technology for Multi-Megabit Network Services," Int Solid-State Circuits Conf 98, San Francisco, 1998, Vol 41, p 16 2 J Danneels, "GSM and Beyond-the Future of Access Network," Int Solid-State Circuits Conf 98, San Francisco, 1998, Vol 41, p 22 3 L S Milor, "A Tutorial Introduction to Research on Analog and Mixed-Signal Circuit Testing," IEEE Trans Circ Syst-I CAS-45, 1389 (1998) 4 Semiconductor Industry Association, The National Technology Roadmap for Semiconductors, Technology Needs, Nov 1997 5 H Komiya, "Future Technological and Economic Prospects for VLSI," Int Solid-State Circuits Conf 93, San Francisco, 1993, p 16 6 A W M vd Enden and N A M Verhoeckx, Discrete Time Signal Processing; an Introduction, Prentice-Hall, Englewood Cliffs, NJ, 1989 7 J Borel, "Technologies for Multimedia Systems on a Chip," Int Solid-State Circuits Conf 97, San Francisco, 1997, Vol 40, p 18 8 R W.

Brodersen, "The Network Computer and its Future," Int Solid-State CircuitsConf 97, San Francisco, 1997, Vol 40, p 32 9 H Veendrick, Deep Submicron CMOS ICs, Kluwer, Deventex, 1998 10 L Bolcioni et al "A IV 350 tW Voice-controlled H263 Video Decoder for Portable Applications," Int Solid-State Circuits Conf San Francisco, 1998, Vol 40, p 112 11 T Sunaga, H Miyatake, K Kitamura, K Kasuya, T Saitoh, M Tanaka, N Tanigaki, Y Mori, and N Yamasahi, "DRAM Macros for ASIC Chips," IEEE J Solid-State Circ SC-30, 1006 (1995) 12 S M Sze, Physics of Semiconductor Devices, Wiley, New York, 1981 13 H C de Graaff and F M Klaassen, Compact TransistorModelingfor Circuit Design, Springer-Verlag, Vienna/NewYork, 1990 14 M J M Pelgrom and M Vertregt, "CMOS Technology For Mixed Signal ICs," SolidState Electron, 967 (1997) 15 J B Shyu, G C Temes, and K.

The vine acted as a natural diffuser and softened the light on the purple and white parts while still adding bright highlights to the top of the stamen On Your Own: Watch the angle of the light play across the subject It doesn t take a big change in the light source to make a big difference in the composition of your photograph Lens Practice Picture: I used the 100mm macro lens On Your Own: Sony makes two dedicated Sony-branded macro lenses: the 100mm f/28 macro lens that has a 1:1 magni cation and a minimum focusing distance of 1 foot 24 inches and the 50mm f/28 macro lens with a 1:1 magni cation and a 78-inch minimum focusing distance.

Yao, "Random Errors in MOS Capacitors," IEEE J Solid-State Circ SC-17, 1070 (1982)..

the very brief mentioning of these functionalities is too short to assess precisely About collaboration, it is said that this is supported at the knowledge level, but how this is achieved remains open Environments like Protege (Fridman et al, 2000) or Chimaera (McGuinness et al, 2000) offer sophisticated support for ontology engineering and merging of ontologies Protege also has a modular plug-in design rational like OntoEdit, but lacks sophisticated support for collaborative engineering They provide limited methodological and collaborative support for ontology engineering A system well-known for its reasoning support is OilEd (Bechhofer et al, 2001b) in combination with the description logics (DL) reasoner FaCT (Bechhofer et al, 2001a) Their collaborative and methodological support is rather weak Some tools explicitly support collaboration during ontology engineering.